Our ClearView db can measure copper and sulfuric acid concentration simultaneously for your electrochemical deposition processing. Our real-time data collection is highly accurate, with an error of ±1 g/L for copper and ±4 g/L for acid. The on-line real time data collected by the ClearView db allows you to make your semiconductor process more efficient while reducing testing costs and employee exposure to hazardous chemicals.

The Model 412 analyzer can continuously monitor cleaning solutions in multiple semiconductor baths simultaneously, increasing the quality of your semiconductors and the efficiency of your production process. With the same accuracy as laboratory methods, the 412 reduces costs by increasing the precision of the delicate semiconductor production process and reducing the need to remove and dispose of chemical samples. In addition, the 412 greatly reduces employee exposure to hazardous chemicals.

The ClearView db is the ideal solution for determining phosphoric acid concentration on-line or in the laboratory. This analyzer can measure 0-100% concentration of phosphoric acid with a root mean squared error of prediction of 0.25% phosphoric acid, and will increase the efficiency of your semiconductor etching or cleaning processes while limiting employee exposure to hazardous chemicals.

The Model 412 can detect low levels of tetramethylammonium hydroxide (TMAH) for your silicon etching needs. The multiple channels available with the 412 also allow you to measure TMAH at multiple locations in the process or measure other process components without exposing your workers to hazardous chemicals. The concentrations of TMAH can be easily measured at 2.38% to better than ±0.1 % v/v.