Analysis of Cu for ECD

Guided Wave offers a compact, non-explosion-proof version of its popular Optical Solutions' brand ClearView photometer and Teflon^® flow cell with a 2 mm optical path for measurement of Cu⁺ and acid concentration for monitoring the electrochemical deposition process.

This system will provide you with 3 4-20 mA outputs for

Cu⁺
Acid
Diagnostic signal all in real-time.

It can also be operated remotely over an etherlink network with our VirtualView software.

Typical precision for Cu is ± 1 g/l and ± 4 g/l for acid.

Number of detectors	3, including 1 reference
Lamp	Patented Optical Solutions' StabLamp with optical feedback, precision-mounted Tungsten-Halogen bulb; ~8 months bulb life nominal
Photometric Drift	<2 mAU over 2-3 weeks with ±5 C variation
Wavelength Drift	0.1 nm VIS typical 0.2 at 1450 nm
Dynamic Range	3.6 AU typical near 1450 nm (non-linearity <1% at 1.6 AU)
Outputs	3 self-powered 4-20 mA analog outputs, 500 ohm load max. Two user-programmable opto-closures. One opto-closure pre-programmed for any fault. Large 3 x 4" LCD display controlled by 3 external buttons on front panel
Inputs	One programmable discrete
Fiber Optics	1 pair of 400 core fiber optic cables provided; 3 meters long each
Flow Cell	Guided Wave Teflon flow cell with 2 mm optical path and 1/2" tube fittings. Wetted parts are Teflon, sapphire windows and Kalrez o-rings.
Environmental	0 - 50 C; 10-90% RH, non-condensing
Dimensions	8x8x8.5" 8 lbs (20x20x22 cm, 9 kg)
Power	24Vdc, <1A, (AC-DC converter supplied with unit for lab testing)

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